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Deprotection Reaction Analysis Device PAGA Series

We provide various devices for advanced evaluation of photoresists.

The Deprotection Reaction Analysis Device PAGA series features in-situ reaction analysis using PEB and 248mm exposure, as well as the capability to calculate deprotection reaction parameters. A bake plate is placed in the FT-IR chamber, allowing for the observation of functional group changes while heating. Additionally, it is equipped with a UV (248nm) irradiation device, which can also be used to analyze mechanisms of acid generation during exposure. For more details, please contact us or refer to the catalog.

  • Other process controls
  • Spectroscopic Analysis Equipment
  • Deprotection reaction analysis device

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